Nano Beam
Position Monitor
The Nano BPM offers transparent X-ray beam monitoring and imaging, allowing for highly focused X-ray beams to be fully characterised in situ. This creates an active feedback loop, with researchers able to monitor and stabilise beam position and shape in real time.
As beam size and sample size are ever decreasing, unavoidable vibrations and ground settlement will cause more and more issues with co-location between beam and sample, increasing the need for consistent feedback on beam position.
The Nano BPM utilises real-time imaging processing to control and maintain beam position.
This has many advantages, removing beam drift, and providing motion feedback for monochromator or mirror systems.
Furthermore, micro-focusing of intense X-ray beams often needs re-adjustments either because the focusing optics is chromatic, or when the focal spot must be relocated.
Therefore, a single device that is able to measure beam position and shape transparently represents an important forward step in technology.
Specifications
| Description | Nano BPM |
|---|---|
| Standard pinhole sizes | 25 µm, 100 µm, 200 µm, 250 µm, 500 µm, 1000 µm |
| Part number | AHQ2402 |
| Operating temperature range | 5 - 40 °C |
| Resolution | < 100 nm |
| Integration time | 0.02 – 5 seconds |
| Digitisation | 16 bit |
| Power input | 12 V (DC) |
| Width | 114 mm |
| Height | 337 mm |
| Depth | 114 mm |
Features
- In-vacuum detector head
- < 100 nm resolution (beam size and intensity dependent)
- Low Z material, amorphous scatterer
- Pinhole focused CMOS imager
- Image processing unit (B100) and control computer (rack mount or desk top)
