Beam Position Ion Chamber (BPIC)
The Beam Position Ion Chamber (BPIC) is a split plate ionisation chamber that can be incorporated into a beamline end station to measure the position and intensity of an X-ray beam. A pair of such chambers (with one rotated through 90º) can be used for both x & y position measurements. This system is ideal for many applications including optimisation of the second crystal angle in a double crystal monochromator, tuning of mirror incidence angles, and controlling the height of end station tables to maximise the flux on a sample.
The Beam Position Ionisation Chamber consists of a Aluminium Vacuum / Pressure chamber, that can be evacuated and back-filled with a gas, fitted in-line to a synchrotron beamline. X-rays enter and leave the chamber via thin conductive Kapton windows at either end of the vessel. The BPIC is designed to operate at a range of 0.7 to 1.5 Bar absolute.
A high voltage is applied across the parallel plates to produce a potential gradient. When X-rays pass through the chamber some are absorbed and produce electron-ion pairs that are subsequently separated by the gradient and collected at the signal plates. The split plates provide differential signals, proportional to the position of the beam, allowing the beam position to be determined.
Specifications
| Description | Beam Position Ion Chamber (BPIC) |
|---|---|
| Part number | AHQ1855 |
| Window aperture | 10 mm x 50 mm |
| Windows | 25 µm Conductive Kapton |
| Electrode Gap (user adjustable) | 10 mm, 14 mm & 18 mm |
| Operating voltage | Up to 2 kV |
| Working pressure | 0.7 - 1.5 bar abs |
| Height | 66 mm |
| Width | 104 mm |
| Length | 158.6 mm |
Adapters
| BPIC to KF40 | BPIC to KF50 | BPIC to CF150 | 90 Degree Kit |
|---|---|---|---|
| AHQ2133 | AHQ2132 | AHQ1880 | AHE0712 |
